Fully Automated Wafer Measurement System

BIM Series

For highly accurate 3D profile measurement of samples that come in various sizes

Features

Performing accurate measurement of height, width, and depth using confocal optics

Enabling surface profile measurement not only for Si wafer samples but also for transparent samples, including SiC wafers and other compound semiconductor materials, and glass panels

Offering different wavelengths of light including visible light and NIR, enabling the profile measurement of shapes on the surface of wafers as well as those under silicon layers

Applications

3D measurement of Si wafers and compound semiconductor materials, including SiC wafers, and capture of high-resolution review images

Measurement of the height and width of redistribution layers (RDLs) on glass substrates in panel-level packaging processes

Profile measurement of sub-surface patterns and defects inside Si wafers

BIM Series Equipment Photo

Specifications

Sample sizes 2 inch – 12 inch (300mm) wafers, 500mm – 600mm large panels
Other Fully automated processing compatible with SECS/GEM