Mask Edge Inspection Equipment
MZ100
Photomask Edge Defect Inspection Equipment
Features
Supports EUV and DUV photomasks for advanced semiconductors
High-sensitivity inspection and high-precision measurement using confocal optical system
Supports inspection of photomask edge areas (side surfaces, bevels)
Applications
EUV and DUV photomask edge defect inspection
Defect review
Defect size and height measurement
Monitoring of various process variations
Specifications
| Inspection Area and Scanning Method | Can inspect all areas except the central 146 x 146mm² of the photomask. ※See figure below |
The MZ100 is a photomask edge defect inspection equipment. It can detect defects occurring in the mask edge area with high precision, contributing to mask quality management.
As semiconductor device miniaturization continues to advance, quality management requirements for photomasks are becoming more stringent. The MZ100 provides high-precision edge inspection capabilities to meet these requirements.
