MPM248
Features
Phase shift measurement system for KrF (248nm) wavelength, which has become an industry standard
Directly uses the same wavelength as the stepper exposure wavelength for phase shift measurement
Can measure transmittance of Att-PSM (attenuated phase shift mask)
Achieves high stability against ground vibration and air turbulence within the system
Applications
Phase shift measurement of phase shift masks
Transmittance measurement of Att-PSM (attenuated phase shift mask)
Specifications
| Substrate Size | 6025 |
| Measurement Wavelength | 248nm |
| Measurement Repeatability | Phase shift measurement: 0.5° (3σ), Transmittance measurement: 0.2% (3σ) |
The MPM248 is a phase shift measurement system for KrF (248nm) wavelength, which has become an industry standard. This equipment directly uses the same wavelength as the stepper exposure wavelength for phase shift measurement, enabling accurate measurement of mask phase shift characteristics under actual exposure conditions.
The MPM248 can not only perform phase shift measurement of phase shift masks, but also measure the transmittance of Att-PSM (attenuated phase shift mask). This enables the equipment to comprehensively evaluate the performance of phase shift masks and provide reliable quality assurance for semiconductor manufacturing processes.
The equipment achieves high stability against ground vibration and air turbulence within the system, maintaining high-precision measurement results even in harsh environments. This feature ensures stable and reliable measurement performance at semiconductor manufacturing sites.
