MATRICS X800LITE Series
Features
Semiconductor mask inspection system supporting design nodes ≥28nm
Equipped with pixel size 100nm and high-power 213nm QCW laser (>400mW) to achieve high sensitivity
High-speed defect detection system enables scan time of 38 minutes per 100mm×100mm area
Equipped with function to measure and visualize mask pattern dimension distribution (CD uniformity) simultaneously with mask inspection
Supports photomask RSP150 and RSP200
Fully automated inspection possible with OHT (Overhead Hoist Transport) integration
Integrated design of stage system and electrical rack system achieves compact footprint
Applications
Acceptance inspection and regular quality assurance inspection of photomasks at wafer fabs
Pre-shipping inspection in photomask manufacturing processes
Specifications
| Inspection Mode | Multi-die mode, Single-die mode |
| Inspection Scan Time | 38 minutes per 100mm×100mm area |
| Supported Mask Types | Cr, MoSi, OMOG |
| Mask Size | 6 inches |
The MATRICS X800LITE series is a compact photomask defect inspection equipment. It can be installed even in limited spaces, enabling efficient inspection.
Through its miniaturized design, the X800LITE series provides high-precision defect detection capabilities while reducing installation costs. It is ideal for small to medium-sized mask shops and research and development facilities.
