MAGICS Series M9650/M9651
Features
Latest defect inspection equipment that combines high detection sensitivity required for next-generation high-quality mask blank defect inspection with high throughput suitable for shipping and acceptance inspection at mass production factories
Based on the core technology of MAGICS, which has become the industry standard for mask blank inspection, adopting the refresh of inspection optical systems and the high-speed inspection circuit technology cultivated in our mask pattern inspection equipment
Dramatically improved defect detection sensitivity not only for substrates but also for each layer of cutting-edge semiconductor mask blanks, enabling selection of higher quality blanks
Cassettes support from multi-level cassettes for blank manufacturers to RSP, MRP for mask shops, and Dual pod for EUVL
M9651 supports Line & Space monitor pattern inspection, making it effective for various process management in mask shops
Applications
Defect inspection of EUV mask blanks, photomask blanks, and substrates
Defect review
Defect sizing
Specifications
| Inspection Light Source Wavelength | 532nm |
| Detection Sensitivity | φ50nm (PSL on quartz substrate, normal mode) |
| Inspection Time | 12 minutes/plate (normal mode, inspection area 142mm×142mm) |
| Supported Substrate Size | 6025 |
Our MAGICS series mask blank defect inspection/review equipment has received high evaluation and trust over many years and is widely used as the industry standard for shipping inspection at mask blank manufacturers and acceptance inspection and process management at mask shops. In recent years, various technological innovations have been made in mask technology, including the application of EUV and new structure masks, to respond to cutting-edge miniaturization processes. To respond to these needs, further high performance and high functionality of mask blank inspection has become urgent.
To respond to these next-generation needs, we have developed the latest model M9650/51, which achieves high detection sensitivity for defect inspection of EUV mask blanks, photomask blanks, and substrates.
M9650/51 is based on MAGICS core technology and significantly improves defect detection sensitivity for minute defects by refreshing the inspection optical system and adopting the high-speed inspection circuit technology cultivated in our mask pattern inspection equipment.
We have commercialized the MAGICS series M9650/M9651 (hereinafter, M9650/51), a mask blank defect inspection equipment for cutting-edge semiconductors from design rule 5nm generation onwards, responding to high sensitivity and high throughput.
