MRS193EX
Features
High resolution achieved through shorter wavelength
Supports review of mask patterns and defects below 100nm
Can observe pellicle-mounted masks
Coordinate data linkage through high-precision stage
Automatic detection and highlight display of defects in field of view
Applications
Mask defect review after defect inspection
Defect size measurement
Support for determining foreign particles (cleanable) and pattern defects (require correction)
Phase shift and transmittance measurement (optional)
Specifications
| Light Source | ArF excimer laser (193nm) |
| Resolution | Supports review of mask patterns and defects below 100nm |
| Supported Mask Types | Can observe pellicle-mounted masks |
The MRS193EX is equipment for defect observation after defect inspection in mask manufacturing. High resolution is achieved through shorter wavelength, making it effective for reviewing mask patterns and defects below 100nm. It can also observe pellicle-mounted masks, maintaining work efficiency and accuracy.
Using a high-precision stage, defects can be easily observed through coordinate data from defect inspection equipment. In addition, it has a function to automatically detect and highlight defects in the field of view, making review smoother.
This equipment shares a common platform with the MPM193EX, and can optionally add phase shift and transmittance measurement functions for phase shift masks, built-in AFM (3D measurement), and defect transfer simulation software linkage.
The MRS193EX is a multifunctional, high-performance mask defect review equipment that plays an important role in defect observation and quality management in mask manufacturing.
