MPM193EX
Features
Phase shift measurement in minute regions of 1μm or less
Supports measurement of pellicle-mounted masks
Improved automatic inspection function
Auto-loader standard equipment
Mini-environment with chemical filter
Applications
Phase shift measurement of phase shift masks
Transmittance measurement
Measurement of pellicle-mounted masks
Mask quality management and inspection
Specifications
| Light Source | ArF excimer laser (193nm) |
| Measurement Accuracy | Phase shift measurement in minute regions of 1μm or less |
| Supported Mask Types | Supports measurement of pellicle-mounted masks |
The MPM193EX is a successor model to the MPM193 phase shift measurement equipment, which has become an industry standard, with improved measurement performance. It can measure pellicle-mounted masks, and the automatic inspection function has also been improved compared to conventional models.
The ability to perform phase shift measurement in minute regions of 1μm or less is a major feature. It can effectively meet inspection needs in high-precision fields such as semiconductors. As semiconductor devices become smaller and more highly integrated, fine inspection of components such as masks has become important, and the MPM193EX can capture information in these minute regions, providing strong support for maintaining quality.
As for the equipment configuration, an auto-loader and a mini-environment with a chemical filter are standard equipment. This creates a stable, clean inspection environment, suppresses the effects of external factors on measurement results, and maintains high precision and stability.
Furthermore, since it uses a common platform with the MRS193EX, users can optionally add mask defect review functionality as needed. This allows the equipment to not only perform basic measurement and inspection tasks, but also defect analysis and review, increasing its overall value.
