MATRICS X9ULTRA Series
Features
Mask inspection system specialized for pellicle-free EUV masks from technology node 3nm onwards
Improved minute foreign particle detection performance through the adoption of high-power 193nm laser and high NA objective lens
Applications
Quality assurance inspection of pellicle-free EUV masks at wafer fabs
Minute foreign particle inspection in EUV mask manufacturing processes
Our photomask inspection equipment, the MATRICS X810EX series and X8ULTRA series, have received high evaluation and are widely used at wafer fabs and mask shops worldwide for their excellent inspection performance, low running costs, and high reliability.
We have commercialized the X9ULTRA series, which further improves the minute foreign particle inspection performance on pellicle-free EUV masks compared to conventional equipment.
In the semiconductor device market, demand continues to grow for 5G, HPC, high-performance servers, and other applications, and the use of EUV lithography is expanding in semiconductor device manufacturing processes. Lasertec commercialized the X8ULTRA series in 2018 for detecting minute foreign particles on EUV masks, and it has been highly acclaimed as an inspection equipment for pellicle-free EUV masks. The newly announced X9ULTRA series further improves minute foreign particle detection performance compared to conventional models by adopting a newly developed in-house high-power 193nm laser light source and high NA objective lens.
