MATRICS X8ULTRA Series
Features
Detection of minute foreign particles on EUV masks
Supports inspection of pellicle-free EUV masks
High-precision inspection capability
Supports EUV lithography
Supports 5G, HPC, and high-performance server applications
Applications
Minute foreign particle inspection of EUV masks
Pellicle-free EUV mask inspection
Mask quality management and inspection
EUV lithography-compatible inspection
Specifications
| Inspection Light Source Wavelength | 193nm |
| Detection Sensitivity | φ30nm (defects on EUV mask) |
| Inspection Time | Approximately 15 minutes/plate |
| Supported Substrate Size | 6025 |
The MATRICS X8ULTRA series is a mask inspection equipment developed for detecting minute foreign particles on EUV masks. It has received high evaluation as an inspection equipment for pellicle-free EUV masks.
In the semiconductor device market, demand continues to grow for 5G, HPC, high-performance servers, and other applications, and the use of EUV lithography is expanding in semiconductor device manufacturing processes. The MATRICS X8ULTRA series provides high-precision inspection capabilities to meet these requirements.
