BASIC Series
Features
Inspection optical system optimized for foreign particle detection on EUV mask backside
Height measurement function for foreign particles affecting EUV exposure
Cleaning (removal) function for foreign particles affecting EUV exposure
Dual pod handling method with no particle generation risk
Scanning method that does not damage patterns
Inspection time applicable for EUV mass production
Fully automated inspection linked with OHT (Overhead Hoist Transport)
Compact all-in-one design with power and control systems built into the main unit
Applications
Regular management and acceptance inspection of EUV mask backside in wafer fabs
Detection, height measurement, and cleaning of foreign particles on EUV mask backside
Shipping inspection at mask manufacturers and blank manufacturers
Specifications
| Main Unit Size | 1,550 (W) x 2,955 (D) x 2,400 (H) |
| Inspection Target Mask | EUV masks (6 inch) |
| Others | We will propose the optimal combination of BASIC series inspection, measurement, and cleaning functions according to customer needs. Please contact us for details. |
The BASIC series is an integrated equipment for EUV mask backside inspection and cleaning. It plays an important role in EUV mask quality management, maintaining mask performance by detecting and removing foreign particles and contamination attached to the mask backside.
With the practical application of EUV lithography, stricter requirements are being demanded for EUV mask quality management. The BASIC series provides high-precision inspection functions and effective cleaning functions to meet these requirements.
