ACTIS A150
Features
EUV light source (wavelength 13.5nm) significantly improves defect detection sensitivity compared to conventional DUV light sources
Inspection with the same wavelength light source as wafer exposure equipment (Actinic inspection) enables high-sensitivity detection of defects that transfer during exposure
Capable of inspecting EUV masks with pellicles
Applications
Defect inspection in EUV mask manufacturing processes
Acceptance inspection and regular quality confirmation inspection of EUV masks at wafer fabs
The EUV mask defect inspection system ACTIS "A150" is the world's first EUV pattern mask defect inspection system that utilizes mask pattern inspection technology developed over many years and EUV light-based inspection technology. By adopting an inspection method using short-wavelength EUV light, it achieves dramatically higher defect detection sensitivity compared to conventional mask inspection equipment using DUV lasers, and can also detect printable phase defects specific to EUV masks.
