ABICS Series E320
Features
Actinic inspection (with the 13.5nm EUV light)
High-sensitivity detection of printable phase defects inside reflective multilayer (Mo/Si)
High-sensitivity and high-speed inspection with 40x dark-field optics
Highly accurate defect coordinate measurement with 1500x high-magnification review
Defect analysis with bright-field and dark-field reviews (defect classification and false defect determination)
Applications
Inspection of phase defects in next-generation EUV mask blanks (Mo/Si multilayer)
Review of phase defects in EUV mask blanks
Output of highly accurate phase defect coordinates for defect mitigation
The ABICS Series "E120" has been widely used in shipping inspection and defect mitigation technology due to its high detection sensitivity for phase defects and defect coordinate accuracy, earning high evaluation and trust from customers.
On the other hand, technical studies for the practical application of High NA EUV lithography toward further miniaturization of semiconductor devices are progressing, and management of even smaller phase defects is required for EUV mask blanks.
The ABICS Series "E320", which has now been commercialized, achieves the defect detection sensitivity and defect coordinate accuracy required for the High NA EUV lithography generation through the adoption of a newly designed high-magnification Schwarzschild optical system and optimization of the illumination optical system.
