ABICS Series E120
Features
Actinic inspection (with the 13.5nm EUV light)
High-sensitivity detection of printable phase defects inside Mo/Si multilayer
High-sensitivity and high-speed inspection with dark-field optics
Highly accurate capturing of defect coordinates with high magnification review
Defect analysis with bright-field and dark-field reviews
Applications
EUV mask blank (Mo/Si multilayer) inspection
EUV mask blank defect analysis
High-accuracy defect location detection
As device patterns become finer, the practical application of next-generation EUV lithography is approaching, and the installation of inspection systems capable of quality control for EUV mask blanks is urgently needed.
We have developed the ABICS "E120", an EUV mask blank defect inspection/review system that contributes to defect management and yield improvement of EUV mask blanks.
Since this system employs an inspection/review method using EUV light, it enables selective detection of printable defects and defect analysis using EUV light. These capabilities greatly contribute to defect management and yield improvement of EUV mask blanks.
