Business Content・Core Technology
Business Activities
Lasertec provides inspection and measurement solutions using optical application technology for various industrial fields including semiconductor mask inspection systems, semiconductor wafer inspection systems, and laser microscopes.
High-precision defect inspection of EUV mask blanks and photomasks
With the practical application of EUV lithography technology and the advancement of semiconductor miniaturization, mask defect inspection has become an indispensable part of the manufacturing process. Our semiconductor mask inspection systems, including EUV mask blank defect inspection systems, are adopted as industry standards, achieving high reliability and precision in the most advanced lithography technology, and demonstrating top performance in photomask-related defect inspection.
Various inspections including wafer etching, film thickness, and SiC wafers
We meet the essential inspection and measurement needs for semiconductor wafer quality assurance. We perform various wafer-related inspections and measurements with high precision, including wafer etching inspection, full-surface film thickness inspection, Si thickness measurement, and SiC wafer defect inspection, supporting quality improvement in semiconductor manufacturing processes.
Hybrid laser microscopes with high functionality and versatility
Used in research and development, and quality management across a wide range of industrial fields including semiconductor materials, transparent films, coating materials, inorganic/organic materials, various biological samples, metal parts, and plastic processed parts.
Core Technology
Optical Application Technology
The core technology that produces Lasertec's revolutionary products is optical application technology.
In the process of thoroughly pursuing the possibilities of inspection and measurement using light, we successfully developed the "laser microscope" using laser as a light source to achieve high resolution. Starting from this, we established "confocal optical system technology" that can obtain high-precision three-dimensional images at all focal points. In addition, we independently developed "DUV/EUV optical system technology" that adapts to the short-wavelength of light sources brought about by the miniaturization of semiconductor lithography technology, and "optical interferometry technology" that can accurately measure minute phase deviations of light.
Lasertec uses these three optical application technologies as core technologies, and by combining them with peripheral technologies, provides solutions that are most suitable for each application, thereby meeting diverse customer needs.
